Pleasant Valley, NY, United States of America

Lawrence Andrew Kropp


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 39(Granted Patents)


Company Filing History:


Years Active: 1995-2001

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2 patents (USPTO):Explore Patents

Title: The Innovations of Lawrence Andrew Kropp

Introduction

Lawrence Andrew Kropp is a notable inventor based in Pleasant Valley, NY (US). He has made significant contributions to the field of chemical vapor deposition and plasma technology. With a total of 2 patents, his work has advanced the understanding and efficiency of etching processes in various applications.

Latest Patents

Kropp's latest patents include "Precise endpoint detection for etching processes" and "Reaction chamber interelectrode gap monitoring by capacitance measurement." The first patent describes a method for detecting crystal dislocations or adsorbed gases during the etching process, enhancing the accuracy of endpoint determination. This innovation allows for the integration of markers within the deposited material without affecting its overall properties. The second patent presents a non-intrusive method for monitoring the interelectrode gap in a reaction chamber, which is crucial for maintaining the efficiency of plasma-enhanced chemical vapor deposition. This method utilizes capacitance measurements to ensure the electrodes remain parallel and properly spaced without the need to open the chamber.

Career Highlights

Kropp is currently associated with International Business Machines Corporation (IBM), where he continues to innovate and contribute to advancements in technology. His work has been instrumental in improving processes that are vital to the semiconductor industry and other high-tech fields.

Collaborations

Throughout his career, Kropp has collaborated with talented individuals such as David Stanasolovich and Marc Jay Weiss. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Lawrence Andrew Kropp's contributions to the field of chemical vapor deposition and plasma technology exemplify the spirit of innovation. His patents not only enhance existing processes but also pave the way for future advancements in the industry.

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