Company Filing History:
Years Active: 1994
Title: LaVerne B Jacobson: Innovator in Semiconductor Polishing Technology
Introduction: LaVerne B Jacobson is a notable inventor based in Owatonna, MN, known for her contributions to the field of semiconductor technology. With one patented invention, she has made significant strides in enhancing the efficiency and effectiveness of polishing semiconductor wafers.
Latest Patents: Jacobson's patent, titled "Slurry Containment Device for Polishing Semiconductor Wafers," presents a liquid abrasive slurry for chemical-mechanical polishing. This innovative device retains the slurry on a rotating polish table through a containment system comprised of two continuous circular bonded strips exhibiting differing flexibilities. A releasable clamp effectively seals the length of the more flexible strip to the table's periphery, thus optimizing the polishing process.
Career Highlights: Jacobson has built her career at the International Business Machines Corporation (IBM), where she develops advanced technologies to enhance semiconductor manufacturing processes. Her dedication and creativity have led her to create solutions that address critical challenges in the industry.
Collaborations: Throughout her career, Jacobson has worked alongside esteemed colleagues, including Willard F Chandler and Robert D Johnson. These collaborations have fostered an environment of innovation, driving advancements in technology and refining manufacturing practices in the semiconductor field.
Conclusion: LaVerne B Jacobson is a pioneering inventor whose work continues to influence semiconductor polishing techniques. Her patent and ongoing contributions at IBM showcase her role in advancing technology, making her an important figure in the world of inventions and innovations.