Laurence C Dumage

Title: The Innovative Contributions of Laurence C Dumage

Introduction

Laurence C Dumage is a notable inventor based in Simi Valley, California. He has made significant contributions to the field of plasma technology, particularly with his innovative patent for a dual discharge plasma device. His work has implications for various applications in electronics and materials processing.

Latest Patents

Dumage holds a patent for a Dual Discharge Plasma Device. This device features a first plasma discharge chamber that contains an electron emitter and a first anode, operating at a high gas pressure to ensure that the discharge voltage remains below the sputtering threshold. The second chamber is equipped with a main anode that receives a plasma plume from the first chamber. This main anode operates at a voltage above the sputtering threshold, while the gas in the second chamber is maintained at a low pressure suitable for conventional low-pressure plasma discharge, which serves as an ion source. He has 1 patent to his name.

Career Highlights

Dumage has had a distinguished career at Hughes Aircraft Company, where he has been involved in cutting-edge research and development. His work has contributed to advancements in plasma technology, enhancing the capabilities of various electronic devices.

Collaborations

One of his notable collaborators is Robert L Seliger, with whom he has worked on various projects related to plasma technology. Their partnership has fostered innovation and has led to significant advancements in their field.

Conclusion

Laurence C Dumage's contributions to plasma technology through his patent for a dual discharge plasma device highlight his innovative spirit and dedication to advancing the field. His work continues to influence the development of new technologies in electronics and materials processing.