Milton, VT, United States of America

Laura Serianni


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2001-2004

where 'Filed Patents' based on already Granted Patents

2 patents (USPTO):

Title: **Laura Serianni: Innovating the Semiconductor Industry**

Introduction

Laura Serianni, an accomplished inventor based in Milton, VT, has made significant contributions to the semiconductor industry through her innovative work. With a total of two patents to her name, she is recognized for her expertise in semiconductor structures and materials.

Latest Patents

Her latest patents focus on the method for forming a semiconductor structure that enhances adhesion and resistance to electromigration. The process involves supplying a structure with an exposed last metalization layer, cleaning this layer, forming a silicide in the top portion of the last metalization layer, and finally, creating a terminal over the silicide. This innovative method is crucial for improving the overall performance and longevity of semiconductor devices.

Career Highlights

Laura is currently affiliated with the International Business Machines Corporation (IBM), a leading technology and consulting firm. Throughout her career, she has demonstrated a commitment to advancing semiconductor technologies, earning respect and recognition within her field.

Collaborations

In her professional journey, Laura has collaborated with notable colleagues, including Douglas S Armbrust and Margaret L Gibson. These partnerships have enabled her to combine various expertise and perspectives, further enriching her inventions and contributions to the industry.

Conclusion

Laura Serianni stands out as a dedicated inventor whose work is shaping the future of semiconductor technologies. Her innovative approach and collaborative efforts within IBM highlight the importance of teamwork and ingenuity in driving technological advancements. With her continued commitment to innovation, Laura is set to inspire future generations of inventors and engineers.

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