Larry Ryan

Title: Larry Ryan - Innovator in Photolithography Temperature Control

Introduction

Larry Ryan is an accomplished inventor based in Pinellas Park, FL (US). He holds a patent that showcases his innovative approach to photolithography, a critical process in semiconductor manufacturing. His work has contributed to advancements in temperature control methods, enhancing the efficiency and effectiveness of photolithographic substrates.

Latest Patents

Larry Ryan's notable patent is titled "Temperature control method for photolithographic substrate." This invention provides a method for processing a photolithographic substrate by placing it on a support member within a chamber. The substrate is initially maintained at a temperature ranging from about zero degrees Celsius to about fifty degrees Celsius. A heat transfer fluid is introduced into the chamber to cool the substrate to a target temperature of less than about zero degrees Celsius, reaching as low as minus forty degrees Celsius. The cooled substrate is then subjected to a plasma process before it can return to its initial temperature. This innovative method significantly improves the processing of photolithographic substrates.

Career Highlights

Throughout his career, Larry Ryan has worked with various companies, including Oerlikon USA, Inc. His experience in the field has allowed him to develop and refine his innovative ideas, leading to his successful patent.

Collaborations

Larry has collaborated with notable coworkers such as Jason Plumhoff and John H. Nolan. Their combined expertise has contributed to the development of advanced technologies in the field of photolithography.

Conclusion

Larry Ryan's contributions to the field of photolithography through his innovative temperature control method demonstrate his commitment to advancing technology. His patent reflects a significant step forward in the processing of photolithographic substrates, showcasing his role as a key inventor in this domain.