Company Filing History:
Years Active: 2005
Title: Larry J Bustos: Innovator in Chemical Mechanical Polishing Technology
Introduction
Larry J Bustos is a notable inventor based in Kyle, Texas, recognized for his contributions to the field of semiconductor manufacturing. He holds a patent for a unique tool that enhances the chemical mechanical polishing (CMP) process, which is essential for achieving smooth surfaces in semiconductor devices.
Latest Patents
Larry J Bustos has one patent to his name, which is focused on a chemical mechanical polishing (CMP) conditioning-disk holder. This innovative tool is designed to hold a conditioning disk that effectively removes impurities from polishing disks used in the planarization of surfaces, particularly semiconductor surfaces. The tool features an elastic disk made from a polymer material, such as polytetrafluoroethylene (PTFE), which is strategically positioned between a clamp and a gimbal hub. This design allows for minimal friction during operation and provides a liquid seal from CMP fluids, ensuring efficient performance.
Career Highlights
Larry Bustos has made significant strides in his career, particularly through his work at Freescale Semiconductor, Inc. His expertise in CMP technology has positioned him as a valuable asset in the semiconductor industry. The durability and strength of the PTFE disk he developed allow for high torque operations and extended use without the need for maintenance, showcasing his innovative approach to engineering challenges.
Collaborations
Larry has collaborated with several talented individuals in his field, including Brian Bottema and Martin W Cain. These partnerships have likely contributed to the advancement of CMP technologies and the successful implementation of innovative solutions in semiconductor manufacturing.
Conclusion
Larry J Bustos is a distinguished inventor whose work in chemical mechanical polishing technology has made a significant impact on the semiconductor industry. His innovative designs and collaborative efforts continue to drive advancements in this critical field.