Seoul, South Korea

Kyung Hee Chung

USPTO Granted Patents = 2 


 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2011-2013

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2 patents (USPTO):Explore Patents

Title: Innovations of Kyung Hee Chung

Introduction

Kyung Hee Chung is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of fabric technology, particularly in the development of electroluminescent fabrics. With a total of two patents to his name, Chung's work showcases the intersection of textiles and advanced technology.

Latest Patents

Chung's latest patents include an "Electroluminescent fabric embedding illuminated fabric display." This invention involves a complex structure comprising a foundation layer made of synthetic, regenerated, or natural fibers, along with several stacked layers including a polymer layer, bus bars, transparent electrodes, fluorescent layers, dielectric layers, and interface electrodes. This innovative fabric allows for illumination, enhancing its functionality and aesthetic appeal. Another patent is for a "Flexible printed conductive fabric and method for fabricating the same." This conductive fabric features a base layer of fibers, a conductive layer that can be formed into pre-designed electric patterns, and an insulating layer to protect the conductive layer from damage.

Career Highlights

Chung is currently employed at Kolon Glotech, Inc., where he continues to push the boundaries of fabric technology. His work has garnered attention for its potential applications in various industries, including fashion, automotive, and electronics.

Collaborations

Chung collaborates with talented individuals such as Sung Mee Park and Kwang Su Cho, contributing to a dynamic and innovative work environment. Their combined expertise fosters creativity and drives the development of groundbreaking technologies.

Conclusion

Kyung Hee Chung's contributions to the field of fabric technology through his innovative patents highlight the potential of integrating advanced technology with textiles. His work not only enhances the functionality of fabrics but also opens new avenues for future applications.

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