Company Filing History:
Years Active: 2020-2021
Title: Kyung Chae Yang: Innovator in Plasma Technology
Introduction
Kyung Chae Yang is a prominent inventor based in Anyang-si, South Korea. He has made significant contributions to the field of plasma technology, holding 2 patents that showcase his innovative approach to ion beam etching and plasma generation.
Latest Patents
Yang's latest patents include an ion beam etching apparatus and an apparatus for generating plasma. The ion beam etching apparatus is designed to generate plasma from process gas and extract ions to create ion beams for etching objects. This apparatus features a plasma chamber, plasma valves, an ion-beam source, and an etching chamber, all working in tandem to efficiently etch materials. His second patent involves an inductively-coupled plasma-generating device that utilizes high and low-frequency power supplies to excite gas into plasma, enhancing the efficiency of substrate treatment.
Career Highlights
Kyung Chae Yang is affiliated with Sungkyunkwan University, where he continues to advance research in plasma technology. His work has been instrumental in developing new methods for material processing, which are crucial in various industrial applications.
Collaborations
Yang collaborates with notable colleagues such as Geun Young Yeom and Da In Sung, contributing to a dynamic research environment that fosters innovation and technological advancement.
Conclusion
Kyung Chae Yang's contributions to plasma technology through his patents and research at Sungkyunkwan University highlight his role as a leading inventor in the field. His work continues to influence advancements in material processing and etching technologies.