Hwaseong-si, South Korea

Kyeong Min Lee

USPTO Granted Patents = 5 

Average Co-Inventor Count = 4.2

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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5 patents (USPTO):Explore Patents

Title: Kyeong Min Lee: Innovator in Substrate Processing Technology

Introduction

Kyeong Min Lee is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of substrate processing, holding a total of 5 patents. His work focuses on enhancing the efficiency and effectiveness of substrate processing methods and apparatuses.

Latest Patents

Kyeong Min Lee's latest patents include innovative substrate processing apparatuses and methods. One of his patents discloses a substrate processing apparatus that allows a chemical liquid to penetrate deeply into the gaps between patterns of a substrate. This apparatus features a chamber with a defined processing space, a chuck to support the substrate, and a chemical liquid supply that delivers droplets of chemical liquid onto the substrate's surface. Additionally, a pressurizer is included to ensure that the chemical liquid fills the gaps between the substrate patterns effectively. Another patent describes a similar substrate processing apparatus that incorporates a rotatable substrate support and a controller to apply varying rotation speeds, generating inertial behavior in the chemical liquid coated on the substrate.

Career Highlights

Kyeong Min Lee is currently employed at Semes Co., Ltd., where he continues to develop innovative solutions in substrate processing technology. His work has been instrumental in advancing the capabilities of substrate processing, making significant impacts in various applications.

Collaborations

Kyeong Min Lee collaborates with talented coworkers, including Kang Sul Kim and Tae-Keun Kim, who contribute to the innovative projects at Semes Co., Ltd. Their teamwork fosters a creative environment that drives technological advancements.

Conclusion

Kyeong Min Lee is a prominent inventor whose work in substrate processing technology has led to multiple patents and significant advancements in the field. His contributions continue to shape the future of substrate processing methods and apparatuses.

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