Hsin-Chu, Taiwan

Kuo-Lung Tang


Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2005-2006

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3 patents (USPTO):

Title: Kuo-Lung Tang: Innovator in Etching Technologies

Introduction

Kuo-Lung Tang is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in etching technologies. With a total of 3 patents to his name, Tang's work has advanced the efficiency and effectiveness of various processes in the industry.

Latest Patents

One of Kuo-Lung Tang's latest patents is titled "Use of ammonia for etching organic low-k dielectrics." This innovative method utilizes ammonia (NH3) as an active etchant, resulting in at least double the etch rate of organic low-k dielectric materials compared to processes using N2/H2 chemistries under similar conditions. The key to this improvement lies in the lower ionization potential of NH3, which leads to significantly higher plasma densities and etchant concentrations.

Another notable patent is the "Method providing an improved bi-layer photoresist pattern." This method involves forming an underlayer of polymer material over a layer, followed by a top image layer. The top image layer is exposed to patterned radiation, and a pattern is developed. The pattern is then transferred from the top image layer to the underlayer using a reducing dry etch, allowing for precise etching of features in the layer.

Career Highlights

Kuo-Lung Tang is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has positioned him as a key player in the development of advanced etching technologies.

Collaborations

Throughout his career, Tang has collaborated with notable colleagues, including Chok Ho and Chung-Ju Lee. These collaborations have further enriched his research and development efforts in the field.

Conclusion

Kuo-Lung Tang's innovative contributions to etching technologies have significantly impacted the semiconductor industry. His patents reflect a commitment to advancing manufacturing processes, making him a valuable inventor in this field.

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