This inventor holds 1 USPTO granted patent. Top assignee: Adeka Corporation. Active years: 2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2010
Title: Kunio Osasawara: Innovator in Siloxane Compounds
Introduction
Kunio Osasawara is a notable inventor based in Sendai, Japan. He has made significant contributions to the field of chemistry, particularly in the development of innovative compositions that incorporate siloxane and phenol compounds. His work has implications for various industrial applications.
Latest Patents
Osasawara holds a patent for a composition containing a siloxane compound and a phenol compound. This composition includes 100 parts by mass of a siloxane compound characterized by the formula —HSiRO, where R can be a hydrogen atom, a hydrocarbon group with 1 to 8 carbon atoms, an alkoxy group with 1 to 8 carbon atoms, or a phenoxy group. Additionally, it contains 0.0001 to 1 part by mass of at least one phenol compound as a stabilizer, which is defined by specific structural parameters.
Career Highlights
Kunio Osasawara is currently employed at Adeka Corporation, where he continues to innovate and develop new chemical compositions. His expertise in siloxane compounds has positioned him as a valuable asset in his field.
Collaborations
Osasawara has worked alongside talented colleagues such as Kazuhisa Onozawa and Hiroki Sato. Their collaborative efforts contribute to the advancement of research and development within their organization.
Conclusion
Kunio Osasawara's contributions to the field of chemistry, particularly through his patented innovations, highlight his role as a significant inventor. His work continues to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile