Kun-Yuan Chen

Title: Innovations by Kun-Yuan Chen: A Patent Profile

Introduction

Kun-Yuan Chen is an accomplished inventor based in Taipei, Taiwan. He has made significant contributions to the field of photomask layout modification, culminating in the granting of a patent that reflects his innovative work. As an employee of Nan Ya Technology Corporation, he has focused on developing methods that enhance the precision and functionality of photomasks used in semiconductor manufacturing.

Latest Patents

Kun-Yuan Chen holds a patent titled "Method for Modifying Photomask Layout." This patent describes a systematic approach to modifying a photomask layout, which includes providing a layout with at least one edge, positioning evaluation points on that edge, and interpreting the layout to derive what is referred to as an interpreted edge pattern. The method then involves calculating shifts between the actual edge and the interpreted edge, deriving gradients between evaluation points, and estimating segments between these points. This innovative process aims to improve the accuracy and efficiency of photomask designs.

Career Highlights

Throughout his career at Nan Ya Technology Corporation, Kun-Yuan Chen has focused on pushing the boundaries of technology in photomask layout optimization. His expertise in this technical domain has not only led to his patent but has also positioned him as a key contributor within his organization. His contributions play a vital role in enhancing the manufacturing processes essential for modern electronics.

Collaborations

Kun-Yuan Chen works closely with his coworker, Chia-Wei Lin, collaborating on various projects that aim to innovate and improve technology in the semiconductor industry. Their teamwork highlights the synergy between inventors in driving forward the boundaries of research and development, showcasing their commitment to excellence within their field.

Conclusion

Kun-Yuan Chen's contributions through his patent reflect his dedication to innovation in photomask technology. His work at Nan Ya Technology Corporation, along with collaborative efforts with colleagues like Chia-Wei Lin, continues to impact the semiconductor industry positively. With the evolving nature of technology, Chen's inventive methodologies will likely play a crucial role in shaping future advancements in this essential field.