Munich, Georgia

Krzystoph Grzelakowski


Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: The Innovations of Krzystoph Grzelakowski

Introduction

Krzystoph Grzelakowski is a notable inventor based in Munich, Germany. He has made significant contributions to the field of electron microscopy, particularly with his innovative designs and methodologies. His work has paved the way for advancements in scientific research and imaging technologies.

Latest Patents

One of his most recognized patents is the Double Reflection Electron Emission Microscope. This invention describes an electron microscope that allows for various study modes to be conducted. The design features an electron reflector positioned in the rear focal plane of the objective lens or in one of its conjugate planes. This reflector is oriented to ensure that the primary beam from the electron source is effectively focused on the specimen being studied. The reflector tip can be constructed from either monocrystalline or polycrystalline materials, enhancing the versatility and effectiveness of the microscope.

Career Highlights

Krzystoph Grzelakowski is currently associated with Focus Limited, where he continues to develop and refine his innovative technologies. His work has garnered attention for its potential applications in various scientific fields, including materials science and nanotechnology.

Conclusion

Krzystoph Grzelakowski's contributions to electron microscopy exemplify the spirit of innovation in scientific research. His patented designs not only enhance imaging capabilities but also open new avenues for exploration in various disciplines.

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