San Jose, CA, United States of America

Kristopher Mikael Koskela


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):

Title: The Innovative Contributions of Kristopher Mikael Koskela

Introduction

Kristopher Mikael Koskela is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of materials science, particularly in the development of methods for forming oxide layers. His work is characterized by a focus on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Koskela holds a patent for a method titled "Growth of thin oxide layer with silicon nitride and conversion." This innovative process involves forming a protective interlayer oxide on the sidewalls of a trench on a substrate. It further includes the deposition of a silicon nitride layer using a plasma-enhanced atomic layer deposition (PE ALD) process with nitrogen-containing gas. The resulting silicon nitride layer features a concentration gradient of nitrogen, which is crucial for the subsequent conversion process that oxidizes the silicon nitride layer into a silicon oxide layer. This patent highlights his expertise in semiconductor fabrication and materials engineering, with a total of 1 patent to his name.

Career Highlights

Koskela is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His role involves working on advanced technologies that drive innovation in the manufacturing of electronic devices. His contributions have been instrumental in improving the performance and reliability of semiconductor products.

Collaborations

Koskela collaborates with various professionals in his field, including his coworker Fredrick Fishburn. Together, they work on projects that push the boundaries of current technologies and explore new possibilities in materials science.

Conclusion

Kristopher Mikael Koskela's work exemplifies the spirit of innovation in the semiconductor industry. His patent and contributions to Applied Materials, Inc. reflect his commitment to advancing technology and improving manufacturing processes. His achievements serve as an inspiration for future inventors in the field.

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