Buffalo, NY, United States of America

Kristen V Baines


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2006

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Inventor Profile: Kristen V. Baines

Introduction

Kristen V. Baines is an accomplished inventor based in Buffalo, NY, known for her innovative work in the field of xerography. With her expertise in polymeric coatings, she has contributed to advancements that significantly enhance the performance of catalytic surfaces in various applications. Her dedication to innovation showcases her commitment to improving technology.

Latest Patents

Kristen holds a patent for her invention titled "Self-regenerative xerographic coatings." This innovation focuses on creating self-regenerative, polymeric coatings which play a crucial role in enhancing the life and effectiveness of catalytic surfaces. By neutralizing harmful ozone and nitrogen oxide species, her invention contributes to improved efficiency in xerographic processes.

Career Highlights

As an integral part of Xerox Corporation, Kristen has made significant strides in her career. Her work on self-regenerative coatings highlights her expertise and reflects the company's commitment to pioneering cutting-edge technologies in printing and imaging.

Collaborations

Kristen has collaborated with notable colleagues, including Christopher David Blair and Thomas Paul Debies. Together, they have worked towards innovative solutions that address the challenges faced in xerographic technology, demonstrating the importance of teamwork in the field of invention.

Conclusion

Kristen V. Baines exemplifies the spirit of innovation through her work in developing self-regenerative coatings for xerographic applications. Her contributions not only enhance technology but also pave the way for future advancements in the field. Her dedication to improving efficiency in xerography solidifies her position as a notable inventor in her area of expertise.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…