Kousuke Ohyama

Title: Kousuke Ohyama: Innovator in Positive Resist Technology

Introduction

Kousuke Ohyama is a prominent inventor based in Joetsu, Japan. He has made significant contributions to the field of resist technology, particularly in the development of positive resist compositions. With a total of two patents to his name, Ohyama's work has had a notable impact on the industry.

Latest Patents

Ohyama's latest patents include a positive resist composition and a pattern forming process. The positive resist composition comprises a base polymer end-capped with a sulfonium salt containing a carboxylate anion linked to a sulfide group. This innovative composition allows for controlled acid diffusion, resulting in a resist film that forms a pattern with excellent profile, high resolution, and reduced edge roughness or dimensional variation. His second patent involves an onium salt that serves as an acid diffusion inhibitor, along with a chemically amplified resist composition. This composition, when processed by lithography, produces patterns with minimal defects and outstanding lithography performance factors such as critical dimension uniformity (CDU), line width roughness (LWR), and depth of focus (DOF).

Career Highlights

Kousuke Ohyama is currently employed at Shin-Etsu Chemical Co., Ltd., where he continues to advance his research and development efforts in resist technology. His work has positioned him as a key figure in the field, contributing to the ongoing evolution of lithographic processes.

Collaborations

Ohyama has collaborated with notable colleagues, including Takayuki Fujiwara and Satoshi Watanabe. These partnerships have fostered innovation and have been instrumental in the successful development of his patented technologies.

Conclusion

Kousuke Ohyama's contributions to positive resist technology exemplify his dedication to innovation in the field. His patents reflect a commitment to enhancing lithographic processes, making him a significant figure in the industry.