Ibaraki, Japan

Kouichi Abe

USPTO Granted Patents = 2 

Average Co-Inventor Count = 6.0

ph-index = 2

Forward Citations = 4(Granted Patents)


Location History:

  • Hitachi, JP (2012)
  • Ibaraki, JP (2019)

Company Filing History:


Years Active: 2012-2019

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2 patents (USPTO):Explore Patents

Title: Innovations of Kouichi Abe

Introduction

Kouichi Abe is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of photosensitive resin compositions and electronic components. With a total of two patents to his name, his work has had a considerable impact on the industry.

Latest Patents

Abe's latest patents include a photosensitive resin composition and a method for manufacturing patterned cured films. This invention provides a photosensitive resin composition comprising an alkali-soluble resin with a phenolic hydroxyl group, a compound that generates acid by light, and an acrylic resin that crosslinks with the alkali-soluble resin. Additionally, he has developed a radiation-sensitive composition that includes a siloxane resin obtained by hydrolyzing and condensing a silane compound, along with a solvent and a quinonediazide sulfonic acid ester.

Career Highlights

Kouichi Abe is currently associated with Hitachi Chemical Company, Ltd. His work at this esteemed organization has allowed him to explore and innovate in the field of materials science, particularly in the development of advanced resin compositions.

Collaborations

Abe has collaborated with notable colleagues such as Shingo Tahara and Shigeki Katogi. Their combined expertise has contributed to the successful development of innovative technologies in their field.

Conclusion

Kouichi Abe's contributions to the field of photosensitive resin compositions and electronic components highlight his role as a significant inventor. His patents reflect a commitment to innovation and advancement in technology.

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