Kotaro Maruyama

Title: Kotaro Maruyama: Innovator in Semiconductor Technology

Introduction

Kotaro Maruyama is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the accuracy and efficiency of pattern defect detection methods and imaging systems.

Latest Patents

Maruyama's latest patents include a pattern defect detection method and an imaging system. The pattern defect detection method is designed to detect defects in semiconductor integrated circuits with higher accuracy. This method involves extracting images of inspection target patterns, identifying reference patterns from design data, and calculating brightness index values to determine defects based on standard ranges.

The imaging system, on the other hand, utilizes a scanning electron microscope to rapidly obtain clear images of inspection targets at varying heights. This system includes a computer that processes two-dimensional design information and height data to focus the electron beam accurately on the specimen.

Career Highlights

Throughout his career, Maruyama has worked with several companies, including Tasmit, Inc. and Ngr Limited. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Maruyama has collaborated with Ryo Shimoda, further enhancing his work in the field of semiconductor technology.

Conclusion

Kotaro Maruyama's contributions to semiconductor technology through his innovative patents and career highlights demonstrate his commitment to advancing the industry. His work continues to influence the development of more accurate and efficient methods in semiconductor inspection.