Kok Mun Hew

Title: Kok Mun Hew: Innovator in UV Curable Coating Technologies

Introduction

Kok Mun Hew is a notable inventor based in Singapore, SG. He has made significant contributions to the field of coating technologies, particularly in the development of UV curable coating compositions. With a total of 2 patents, his work has garnered attention in the industry.

Latest Patents

Kok Mun Hew's latest patents include innovative methods for coating inkjet print heads. One of his patents discloses a method of coating using a UV curable coating composition that contains a (methyl)acryloxy or vinyl functionalized silane, silica, and an acrylate oligomer with at least two acrylate groups. Another patent focuses on a UV curable coating composition that comprises similar components, showcasing his expertise in this specialized area.

Career Highlights

Kok Mun Hew is currently associated with Hewlett-Packard Development Company, L.P., where he continues to advance his research and development efforts. His work has been instrumental in enhancing the performance and durability of coating applications in various technologies.

Collaborations

Throughout his career, Kok Mun Hew has collaborated with talented individuals such as Andrew McIntosh Soutar and Min Qian. These collaborations have contributed to the successful development of his innovative patents.

Conclusion

Kok Mun Hew stands out as a prominent inventor in the field of UV curable coating technologies. His contributions through his patents and collaborations reflect his commitment to innovation and excellence in his work.