Company Filing History:
Years Active: 2019-2022
Title: Innovations by Koji Kaneko
Introduction
Koji Kaneko is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of technology, particularly in methods related to semiconductor manufacturing and electron microscopy. With a total of 2 patents, his work showcases innovative approaches to complex engineering challenges.
Latest Patents
Kaneko's latest patents include a method and apparatus for generating a correction line that indicates the relationship between the deviation of a wafer pattern edge from a reference pattern edge and the space width of the reference pattern. This method involves creating an appearance-frequency graph, obtaining images of wafer patterns, calculating deviations, and generating a correction line based on the data points plotted on a coordinate system.
Another significant patent is a method for verifying the operation parameters of a scanning electron microscope. This method ensures that parameters such as focus and astigmatism correction are correctly adjusted. It includes determining the ratio of edge lengths in different directions, generating images while changing parameters, and calculating edge sharpness to emit an alarm if discrepancies are found.
Career Highlights
Throughout his career, Koji Kaneko has worked with various companies, including Ngr Limited and Tasmit, Inc. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.
Collaborations
Due to space constraints, the collaborations section will be omitted.
Conclusion
Koji Kaneko's innovative patents and career achievements highlight his significant role in advancing technology in semiconductor manufacturing and electron microscopy. His contributions continue to influence the industry and inspire future innovations.