Company Filing History:
Years Active: 1995
Title: Koichiro Tsutahara: Innovator in Chemical Vapor Deposition Technology
Introduction
Koichiro Tsutahara is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of chemical vapor deposition technology. His innovative approach has led to advancements that enhance the efficiency and accuracy of film deposition processes.
Latest Patents
Tsutahara holds a patent for a reaction chamber designed for a chemical vapor deposition apparatus. The main feature of this invention is to provide a reaction chamber that achieves uniform film deposition with high accuracy and stability. The apparatus includes a wafer heating stage that holds a wafer with the surface downwards and heats it. This heating stage rotates around its center, while a gas supplying head is positioned to supply reaction gas towards the wafer heating stage. The design includes a reaction chamber forming member that surrounds the spacing region between the wafer heating stage and the gas supplying head, ensuring a closed reaction chamber. An exhaust outlet is strategically placed to discharge gas in an upward oblique direction, enhancing the overall efficiency of the process.
Career Highlights
Tsutahara is associated with Mitsubishi Electric Corporation, where he has been instrumental in developing advanced technologies in his field. His work has been recognized for its impact on improving manufacturing processes and product quality.
Collaborations
He has collaborated with notable colleagues such as Toru Yamaguchi and Taizo Ejima, contributing to various projects that push the boundaries of innovation in chemical vapor deposition.
Conclusion
Koichiro Tsutahara's contributions to chemical vapor deposition technology exemplify the spirit of innovation. His patent reflects a commitment to enhancing manufacturing processes, making him a significant figure in his field.