Tokyo, Japan

Koichiro Irie

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi High-Tech Corporation. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koichiro Irie. Retrieved from https://idiyas.com/inventor/koichiro-irie

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Koichiro Irie: Innovator in Pattern Evaluation Technology

Introduction

Koichiro Irie is a prominent inventor based in Minato-ku, Japan. He has made significant contributions to the field of pattern evaluation technology. His innovative work has led to the development of a unique system that enhances the evaluation of patterns formed inside samples.

Latest Patents

Koichiro Irie holds 1 patent for his invention titled "Pattern evaluation system and pattern evaluation method." This technology provides a method for evaluating the properties of a pattern using two-dimensional information from a sample. The system includes a computer subsystem that executes various processes, such as acquiring images of the sample, extracting signal waveforms, calculating feature amounts, and comparing these amounts with reference values to evaluate the pattern's properties.

Career Highlights

Irie is currently employed at Hitachi High-Tech Corporation, where he continues to advance his research and development efforts. His work at the company has positioned him as a key player in the field of technology related to pattern evaluation.

Collaborations

Some of his notable coworkers include Ayumi Doi and Tianming Li, who contribute to the collaborative environment that fosters innovation within their projects.

Conclusion

Koichiro Irie's contributions to pattern evaluation technology exemplify the impact of innovative thinking in the field. His work not only enhances the understanding of patterns in samples but also showcases the importance of collaboration in technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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