Tokyo, Japan

Koichi Ohira


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 46(Granted Patents)


Company Filing History:

goldMedal1 out of 832,680 
Other
 patents

Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Innovations by Koichi Ohira: A Pioneer in Semiconductor Technology

Introduction

Koichi Ohira, an accomplished inventor based in Tokyo, Japan, has made significant contributions to the field of semiconductor technology. His work has led to innovative methods that enhance the manufacturing processes of semiconductor devices, particularly regarding low dielectric constant insulating films.

Latest Patents

Ohira holds a patent for a "Semiconductor device manufacturing method having a porous insulating film." This invention pertains to a method for forming a via hole or a contact hole in an interlayer insulating film, emphasizing a low dielectric constant material. The process involves several steps: forming a nitrogen-containing insulating film on a substrate, creating a porous insulating film, and subsequently forming an opening in both films. The innovative use of a plasma of ammonia gas, nitrogen gas, or oxygen nitride gas to enhance the surfaces of the porous insulating film plays a crucial role in his patent.

Career Highlights

Throughout his career, Koichi Ohira has focused on advancing semiconductor manufacturing technologies. His patent not only demonstrates his technical expertise but also highlights his commitment to improving the efficiency and performance of semiconductor devices. Ohira's work is vital in an industry that constantly seeks to push the boundaries of technology.

Collaborations

Koichi Ohira has collaborated with notable professionals such as Tomomi Suzuki and Hiroshi Ikakura. These collaborations emphasize the importance of teamwork in driving innovation, as they collectively contribute to the development of advanced semiconductor manufacturing methods.

Conclusion

Koichi Ohira stands out as a key figure in semiconductor innovation. His dedication to creating a method for manufacturing semiconductor devices with a porous insulating film underscores his role as an inventor in a rapidly evolving technological landscape. His contributions continue to pave the way for future advancements in the semiconductor industry.

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