Kohichi Orihira

Title: Kohichi Orihira: Innovator in Ion Implantation Technology

Introduction

Kohichi Orihira is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of ion implantation technology, holding a total of 2 patents. His work has been instrumental in advancing the capabilities of ion implanters, which are crucial in various applications, including semiconductor manufacturing.

Latest Patents

Orihira's latest patents include an innovative ion implanter and an ion implanting apparatus. The ion implanter features an implantation chamber that introduces an ion beam, along with a holder designed to hold substrates on two columns in an X-direction. It also includes a holder driving unit that allows for precise positioning of the holder in both horizontal and standing states. Additionally, the ion implanter is equipped with two load lock mechanisms and substrate carrying units that facilitate the transfer of substrates between different positions. The ion implanting apparatus is equipped with a control device that manages its operating state during periods when ion implantation is not in progress, offering various modes to optimize performance.

Career Highlights

Throughout his career, Orihira has worked with prominent companies such as Nissin Electric Co., Ltd. and Nissin Ion Equipment Co., Ltd. His experience in these organizations has contributed to his expertise in ion implantation technology and has allowed him to develop innovative solutions in this field.

Collaborations

Orihira has collaborated with notable colleagues, including Takao Matsumoto and Kazuhiro Nakao. These collaborations have further enriched his work and have led to advancements in ion implantation technology.

Conclusion

Kohichi Orihira's contributions to ion implantation technology through his patents and career achievements highlight his role as a significant innovator in the field. His work continues to influence the development of advanced manufacturing processes.