N. Somerset, United Kingdom

Knut Beekman


Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 116(Granted Patents)


Location History:

  • Bristol, GB (2001)
  • N. Somerset, GB (2003)

Company Filing History:


Years Active: 2001-2003

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Knut Beekman

Introduction

Knut Beekman is a notable inventor based in North Somerset, Great Britain. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to treating silicon-containing polymer layers and semiconductor substrates.

Latest Patents

Knut Beekman's latest patents include a method for treating silicon-containing polymer layers with plasma or electromagnetic radiation. In this method, a silicon-containing polymer is deposited in a recess on the surface of a substrate, which is then heated to a specific temperature. The heated substrate, with the polymer deposited, is subjected to gas or vapor activated by plasma or other electromagnetic radiation, distinct from the heat source used for heating. His second patent involves methods and apparatus for treating a semiconductor substrate. This process includes depositing a liquid short-chain polymer on a substrate, which is then subjected to further polymerization to form an amorphous structure.

Career Highlights

Knut Beekman has established himself as a key figure in his field through his innovative work at Trikon Equipments Limited. His expertise in semiconductor technology has contributed to advancements in the industry, particularly in the treatment of polymer layers and substrates.

Collaborations

Knut has collaborated with talented coworkers such as Jashu Patel and Adrian Kiermasz, enhancing the innovative environment at Trikon Equipments Limited.

Conclusion

Knut Beekman's contributions to semiconductor technology through his patents reflect his dedication to innovation and advancement in the field. His work continues to influence the industry and inspire future developments.

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