Klaus Walter Arlt

Title: Innovations by Klaus Walter Arlt

Introduction

Klaus Walter Arlt is a notable inventor based in Itzehoe, Germany. He has made significant contributions to the field of photopolymer exposure technology. With a total of three patents to his name, Arlt has demonstrated a commitment to advancing innovative solutions in his industry.

Latest Patents

Arlt's latest patents include a UV LED radiation source designed for use in photopolymer exposure. This invention features a source of actinic radiation that is effective for curing printing plates. The design includes a base with a heat sink, which has a length greater than its width. One or more circuit boards are mounted on the base, providing a plurality of light-emitting diodes (LEDs) distributed along its length. A transparent or translucent cover, in conjunction with the base, forms an enclosure for the LEDs. This source is capable of emitting radiation at angles greater than those of a single LED, making it versatile for various applications. Additionally, Arlt has developed methods and systems for bank exposure of printing plates using these innovative sources.

Another significant patent involves systems and methods for combined radiation and functional layer application. This system includes one or more radiation sources and a functional layer application unit that is strategically located to apply a functional layer over the surface of a fixed target. This can occur during relative motion between the target and the radiation sources/application unit. The system accommodates both stationary and moving targets, and the functional layer can be applied in liquid or solid laminate forms. This invention is particularly relevant for applying an oxygen-blocking layer to a printing plate before exposure to actinic radiation.

Career Highlights

Klaus Walter Arlt has established himself as a key figure in the field of imaging technology. He works at Esko-Graphics Imaging GmbH, where he continues to innovate and develop new technologies that enhance the printing process. His work has been instrumental in improving the efficiency and effectiveness of photopolymer exposure techniques.

Collaborations

Arlt collaborates with various professionals in his field, including his coworker Wolfgang Sievers. Their combined expertise contributes to the advancement of technologies in the imaging sector.

Conclusion

Klaus Walter Arlt's contributions to the field of photopolymer exposure technology are noteworthy. His innovative patents and ongoing work at Esko-Graphics Imaging GmbH highlight his dedication to advancing the industry. Through his inventions