Location History:
- Besigheim, DE (2012)
- Mundelsheim, DE (2014 - 2023)
Company Filing History:
Years Active: 2012-2023
Title: Klaus Stoppel: Innovator in Lidar Technology
Introduction
Klaus Stoppel is a prominent inventor based in Mundelsheim, Germany. He has made significant contributions to the field of lidar technology, holding a total of 13 patents. His work focuses on enhancing the functionality and efficiency of lidar sensors, which are crucial for various applications, including autonomous vehicles and environmental monitoring.
Latest Patents
Stoppel's latest patents include a component assembly for a lidar sensor and a lidar device utilizing multiple radiation sources. The component assembly patent describes a system that incorporates a stator, rotor, and a detector system with a first optical waveguide. This innovative design allows the optical waveguide to rotate with the rotor, effectively guiding light beams from the surrounding area to the detector. His other patent details a transmitting unit for a lidar device that employs at least two radiation sources. These sources can adjust their operating temperatures based on the emission angle, improving the signal-to-noise ratio of the lidar device.
Career Highlights
Klaus Stoppel has had a distinguished career at Robert Bosch GmbH, where he has been instrumental in advancing lidar technology. His expertise and innovative mindset have led to the development of cutting-edge solutions that enhance the performance of lidar systems. His contributions have positioned him as a key figure in the field of optical sensing technologies.
Collaborations
Stoppel has collaborated with notable colleagues, including Hans-Jochen Schwarz and Mustafa Kamil. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of innovative technologies.
Conclusion
Klaus Stoppel's work in lidar technology exemplifies the impact of innovation in modern sensing systems. His patents and collaborations continue to shape the future of this critical field.