Klaus J Hüttinger

Title: Klaus J Hüttinger: Innovator in Chemical Vapor Infiltration

Introduction

Klaus J Hüttinger is a notable inventor based in Karlsruhe, Germany. He has made significant contributions to the field of chemical vapor infiltration, particularly in the development of methods for processing refractory substances. His innovative approach has implications for various industries, including materials science and engineering.

Latest Patents

Hüttinger holds a patent for a "Method for chemical vapor infiltration of refractory substances, especially carbon and silicon carbide." This method involves isothermic and isobaric chemical vapor infiltration (CVI) of refractory materials. The process is based on diffusion in a porous structure, where specific conditions of gas pressure and dwell time are maintained to facilitate a deposition reaction. The method ensures that the deposition speed remains constant, even under varying pressures, while limiting the solid phase deposition to no more than 50% of the elements in the educt gas.

Career Highlights

Klaus J Hüttinger is associated with Sintec Keramik GmbH & Co. KG, where he has applied his expertise in chemical processes. His work has been instrumental in advancing the understanding and application of chemical vapor infiltration techniques. Hüttinger's innovative methods have the potential to enhance the performance and durability of materials used in various applications.

Collaborations

Hüttinger has collaborated with Walther Benzinger, contributing to the development of advanced materials and processes. Their partnership has fostered innovation and has led to significant advancements in the field of refractory substances.

Conclusion

Klaus J Hüttinger's contributions to the field of chemical vapor infiltration exemplify the impact of innovative thinking in materials science. His patented methods and collaborative efforts continue to influence the industry, paving the way for future advancements.