Maxhuette-Haidhof, Germany

Klaus Hoepfl

USPTO Granted Patents = 16 

 

Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 26(Granted Patents)


Location History:

  • Maxhütte-Haidhof, DE (2009 - 2010)
  • Maxhuette-Haihof, DE (2016)
  • Maxhuette-Haidhof, DE (2014 - 2023)

Company Filing History:


Years Active: 2009-2025

Loading Chart...
Loading Chart...
16 patents (USPTO):Explore Patents

Title: Klaus Hoepfl: Innovator in Vacuum Interrupter Technology

Introduction

Klaus Hoepfl is a distinguished inventor based in Maxhuette-Haidhof, Germany. He has made significant contributions to the field of electrical engineering, particularly in the development of vacuum interrupters. With a total of 16 patents to his name, Hoepfl has established himself as a leading figure in his industry.

Latest Patents

Among his latest innovations is a vacuum interrupter arrangement designed for use in tap changers. This arrangement features a vacuum interrupter, a metal shield to protect against external magnetic fields, and a holder that maintains the position of the metal shield relative to the vacuum interrupter. Another notable patent is for a load transfer switch for on-load tap changers, which includes a diverter switch with a vacuum interrupter and an actuating element. This design allows for efficient actuation of the vacuum interrupter through a roller mechanism.

Career Highlights

Klaus Hoepfl is currently employed at Maschinenfabrik Reinhausen GmbH, where he continues to innovate and develop advanced electrical solutions. His work has been instrumental in enhancing the reliability and efficiency of electrical systems.

Collaborations

Throughout his career, Hoepfl has collaborated with talented individuals such as Silke Wrede and Gregor Wilhelm. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Klaus Hoepfl's contributions to vacuum interrupter technology have made a lasting impact on the electrical engineering field. His innovative designs and collaborative efforts continue to drive advancements in this critical area of technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…