Location History:
- Zurich, CH (1983)
- Herrliberg, CH (1983)
Company Filing History:
Years Active: 1983
Title: Klaus Frick: Innovator in Reactive Sputter Etching and Photoresist Development
Introduction
Klaus Frick is a notable inventor based in Zurich, Switzerland. He has made significant contributions to the field of materials science, particularly in the areas of reactive sputter etching and photoresist development. With a total of two patents to his name, Frick's work has advanced the technology used in various industrial applications.
Latest Patents
Frick's latest patents include an innovative apparatus for reactive sputter etching of aluminum. This improved sputter etching apparatus utilizes a cryogenic pump as the vacuum means to evacuate the plasma chamber. This advancement is particularly beneficial for etching aluminum substrates with highly reactive gases, such as boron trichloride. Additionally, he has developed an improved method for etching a silver-doped germanium selenide resist film, utilizing sulfur hexafluoride as the etchant gas.
Career Highlights
Klaus Frick has built a career that showcases his expertise in the field of materials engineering. His work has not only contributed to the advancement of technology but has also positioned him as a respected figure in the industry. He is currently associated with RCA Inc., where he continues to innovate and develop new technologies.
Collaborations
Throughout his career, Frick has collaborated with esteemed colleagues, including Paul G. Huggett and Hans W. Lehmann. These collaborations have further enriched his work and contributed to the success of his inventions.
Conclusion
Klaus Frick's contributions to the fields of reactive sputter etching and photoresist development highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving industrial processes, making him a significant figure in his field.