Klaus Ergenzinger

Title: Klaus Ergenzinger: Innovator in Semiconductor Fabrication

Introduction

Klaus Ergenzinger is a notable inventor based in Oberhaching, Germany. He has made significant contributions to the field of semiconductor fabrication, particularly through his innovative patent that enhances the lithographic process.

Latest Patents

Klaus holds a patent for a "Trimming mask with semitransparent phase-shifting regions." This invention is crucial for lithographically producing the smallest structures at dimensions less than the exposure wavelengths in semiconductor fabrication. The process involves a double exposure using a thick phase mask and a trimming mask, which further structures the phase-contrast lines produced by the phase mask. The trimming mask features not only transparent or opaque regions but also phase-shifting regions that surround the transparent areas. This design allows for the local re-exposure of phase-contrast lines, resulting in an intensity profile that is rich in contrast. Consequently, the distances between line sections can be reduced, making the trimming mask suitable for configuring the finest dimensionally critical structures.

Career Highlights

Klaus Ergenzinger is associated with Siemens Aktiengesellschaft, a leading company in technology and engineering. His work has been instrumental in advancing semiconductor technologies, and his patent reflects his expertise in the field.

Collaborations

Klaus has collaborated with notable colleagues, including Rainer Pforr and Christoph Friedrich. Their combined efforts contribute to the innovative environment at Siemens and enhance the development of cutting-edge technologies.

Conclusion

Klaus Ergenzinger's contributions to semiconductor fabrication through his innovative patent demonstrate his significant role in advancing technology. His work continues to influence the industry and pave the way for future innovations.