Company Filing History:
Years Active: 1999
Title: Kiyoto Mori: Innovator in Rinsing Solutions for Integrated Circuits
Introduction
Kiyoto Mori is a notable inventor based in Tsuchiura, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of rinsing solutions used after the resist stripping process. His innovative approach addresses critical challenges in the industry, ensuring the integrity of materials used in high-density integrated circuits.
Latest Patents
Kiyoto Mori holds a patent for a rinsing solution after the resist stripping process. This patent describes a method where, after the resist is removed with an alkaline solution, a noncorrosive rinse solution is applied to the substrate. The rinse solution is composed of either a water-soluble monovalent lower alcohol and an organic or inorganic acid, or a combination of these components with water. This innovative rinse solution effectively prevents corrosion when removing resist from Al-Si-Cu wiring material, which is widely utilized in high-density integrated circuits. He has 1 patent to his name.
Career Highlights
Kiyoto Mori is currently employed at Texas Instruments Corporation, where he continues to work on advancements in semiconductor technology. His expertise in rinsing solutions has positioned him as a valuable asset in the field, contributing to the development of more efficient manufacturing processes.
Collaborations
Throughout his career, Kiyoto has collaborated with notable colleagues, including Hideto Gotoh and Masao Miyazaki. These collaborations have fostered an environment of innovation and have led to significant advancements in their respective fields.
Conclusion
Kiyoto Mori's contributions to the semiconductor industry, particularly through his patented rinsing solution, highlight his role as an innovator. His work not only addresses corrosion issues in integrated circuits but also enhances the overall manufacturing process. His ongoing efforts at Texas Instruments Corporation continue to shape the future of semiconductor technology.