Company Filing History:
Years Active: 1984-1990
Title: **Innovator Spotlight: Kiyohiko Yamamuro**
Introduction
Kiyohiko Yamamuro, a distinguished inventor based in Kanagawa, Japan, has made significant contributions to the field of lithography and light-sensitive materials. With an impressive portfolio of 15 patents, Yamamuro's innovations have played a crucial role in advancing photographic technology.
Latest Patents
Yamamuro's latest patents demonstrate his expertise and innovative spirit. One of his notable inventions is the "Presensitized plate for lithography," which features a support layer equipped with a non-silver light-sensitive layer comprising an O-quinonediazide compound, along with a silver halide light-sensitive layer. This design enhances the sensitivity of the presensitized plate to light wavelengths between 480 nm and 520 nm, enabling its handling under lighter safe light conditions.
Another significant patent is the "Heat developable color light-sensitive material." This invention involves a support coated with a light-sensitive silver halide emulsion and a binder, along with a compound that possesses a dye moiety. The innovative aspect of this material is its ability to release a dye through the reduction of light-sensitive silver halide to silver at elevated temperatures, providing enhanced performance for color development.
Career Highlights
Throughout his career, Kiyohiko Yamamuro has been associated with Fuji Photo Film Company, Limited. His work at the company has been instrumental in pushing the boundaries of imaging technologies and the development of advanced printing solutions.
Collaborations
Yamamuro has collaborated with several notable professionals in his field, including Yasuo Iwasa and Shigeo Hirano. These partnerships have contributed to the successful innovation of products and processes that are widely used in the photography and imaging industries.
Conclusion
Kiyohiko Yamamuro stands out as a leading figure in the realm of innovation in lithography and light-sensitive materials. His numerous patents reflect his commitment to advancing technology and enhancing product performance. As he continues to innovate and collaborate with others in the industry, Yamamuro's work will undoubtedly leave a lasting impact on the field of photography and beyond.