Kishore Lavu

Title: Kishore Lavu: Innovator in Plasma Sputtering Technology

Introduction

Kishore Lavu is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of plasma sputtering technology, particularly in the deposition of tungsten layers for integrated circuits. With a total of 2 patents, his work has implications for the semiconductor industry.

Latest Patents

Kishore Lavu's latest patents include innovative methods for depositing tungsten layers. One of his patents, titled "Krypton sputtering of low resistivity tungsten," describes a process for depositing a bilayer of tungsten over tungsten nitride using krypton as the sputter working gas. This method enhances the reduction of tungsten resistivity, especially when the tungsten layer thickness is less than 50 nm, and further improves when it is less than 35 nm. This technique is particularly useful in forming gate stacks in MOS transistors, where tungsten nitride serves as a barrier. Another patent, "Krypton sputtering of thin tungsten layer for integrated circuits," outlines a similar process, emphasizing the benefits of using krypton and argon gases in the sputtering process.

Career Highlights

Kishore Lavu is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to develop and refine his innovative sputtering techniques, contributing to advancements in integrated circuit manufacturing.

Collaborations

Kishore has collaborated with notable colleagues such as Wei D Wang and Srinivas Gandikota. These collaborations have fostered a productive environment for innovation and development in the field of plasma sputtering technology.

Conclusion

Kishore Lavu's contributions to plasma sputtering technology and his innovative methods for tungsten deposition have positioned him as a key figure in the semiconductor industry. His work continues to influence advancements in integrated circuit manufacturing.