Company Filing History:
Years Active: 1999-2002
Title: Kimihiro Okada: Innovator in Phase Shift Mask Technology
Introduction
Kimihiro Okada is a prominent inventor based in Kofu, Japan. He has made significant contributions to the field of optical technology, particularly in the development of phase shift masks. With a total of 4 patents to his name, Okada's work has advanced the capabilities of photolithography in semiconductor manufacturing.
Latest Patents
Okada's latest patents focus on the design and functionality of phase shift masks and phase shift mask blanks. These innovations include a half-tone type phase shift mask that features a thin film light translucent portion composed of nitrogen, metal, and silicon. The specific ratios and containing rates of these elements are meticulously defined to enhance various film characteristics. These characteristics include acid resistance, photo resistance, conductivity, refractive index rate, light transmission rate, and etching selectivity. The resulting phase shift mask not only meets high precision optical characteristics but also minimizes defects in the thin film.
Career Highlights
Throughout his career, Kimihiro Okada has been associated with Hoya Corporation, a leading company in optical products. His work has been instrumental in pushing the boundaries of what is possible in the realm of photolithography. His innovative approaches have garnered attention and respect within the industry.
Collaborations
Okada has collaborated with notable colleagues, including Masaru Mitsui and Hideki Suda. These partnerships have contributed to the successful development of advanced optical technologies.
Conclusion
Kimihiro Okada's contributions to phase shift mask technology exemplify his innovative spirit and dedication to advancing optical engineering. His patents reflect a commitment to improving the efficiency and effectiveness of semiconductor manufacturing processes.