Kiyakyushu, Japan

Kimihiko Yoshida


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2004-2006

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2 patents (USPTO):Explore Patents

Title: Kimihiko Yoshida: Innovator in Plating Film Technology

Introduction

Kimihiko Yoshida is a notable inventor based in Kitakyushu, Japan. He has made significant contributions to the field of plating film technology, holding 2 patents that enhance the solderability of plating films for lead-free solder applications. His innovative methods have the potential to improve productivity and reduce production costs in the manufacturing process.

Latest Patents

Yoshida's latest patents include a method for forming a plating film. This method involves applying a plating film onto an object to be plated at a first current density for a predetermined period in a plating bath. The process includes maintaining the object at a second current density that is lower than the first. This innovative approach improves the solderability of plating films, allowing for enhanced productivity and reduced costs.

Career Highlights

Throughout his career, Kimihiko Yoshida has worked with various companies, including Sharp Kabushiki Kaisha Corporation. His experience in the industry has equipped him with the knowledge and skills necessary to develop effective plating film technologies.

Collaborations

Yoshida has collaborated with notable coworkers such as Yoshihiko Matsuo and Ryukichi Ikeda. Their combined expertise has contributed to advancements in the field of plating film technology.

Conclusion

Kimihiko Yoshida's innovative work in plating film technology showcases his dedication to improving manufacturing processes. His patents reflect a commitment to enhancing solderability and reducing production costs, making him a valuable contributor to the industry.

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