Venlo, Netherlands

Kimball M Leek


 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Kimball M Leek: Innovator in Image Application Technology

Introduction

Kimball M Leek is a notable inventor based in Venlo, Netherlands. He has made significant contributions to the field of image application technology, particularly through his innovative methods in printing.

Latest Patents

Kimball M Leek holds a patent for a "Method for applying an image." This invention relates to a method for applying an image onto a recording medium. The method allows for images to be printed with a predetermined gloss, enabling prints to have local differences in gloss level. Additionally, it pertains to an ink-jet printing apparatus, showcasing his expertise in this area.

Career Highlights

Kimball M Leek is associated with Canon Production Printing Holding B.V., where he has been instrumental in developing advanced printing technologies. His work has contributed to enhancing the quality and versatility of printed images.

Collaborations

He has collaborated with notable coworkers such as Clemens T Weijkamp and Pim Van Der Asdonk, further enriching the innovative environment at Canon.

Conclusion

Kimball M Leek's contributions to image application technology through his patent and work at Canon highlight his role as a significant inventor in the printing industry.

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