Cleveland, OH, United States of America

Kimala L Laster


Average Co-Inventor Count = 11.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2019

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Kimala L Laster in Microelectronics

Introduction:

Kimala L Laster is an accomplished inventor based in Cleveland, OH, known for his significant contribution to the field of microelectronics. With a focus on enhancing the durability of electrical connections in extreme environments, Laster has garnered attention for his inventive ideas and practical applications.

Latest Patents:

Laster holds a patent for a "Durable bond pad structure for electrical connection to extreme environment microelectronic integrated circuits." This patent describes a robust bond pad structure that facilitates highly durable electrical connections to semiconductor microelectronics chips, such as silicon carbide (SiC) chips. This innovation ensures prolonged operation under very extreme temperature ranges, making it a vital advancement in the microelectronics industry.

Career Highlights:

Laster is currently employed at NASA, where he represents the United States of America in various projects and research initiatives. His work at NASA highlights his commitment to pioneering technologies that push the boundaries of conventional microelectronic applications.

Collaborations:

Throughout his career, Laster has collaborated with esteemed colleagues, including David James Spry and Dorothy Lukco. These collaborations reflect the teamwork and synergy that drive innovation in their projects, as they work collectively to address the challenges of modern technology.

Conclusion:

Kimala L Laster continues to make strides in the field of microelectronics with his innovative spirit and dedication to technology. His work not only enhances electrical connections for extreme conditions but also inspires future generations of inventors to explore new possibilities within the realm of inventions and patents.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…