Campbell, CA, United States of America

Kim Do


Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 5(Granted Patents)


Location History:

  • Morristown, NJ (US) (2012)
  • Campbell, CA (US) (2014)

Company Filing History:


Years Active: 2012-2014

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Innovations by Inventor Kim Do

Introduction

Kim Do is an accomplished inventor based in Campbell, California, known for his contributions to the field of materials science and engineering. With a focus on advanced compositions and coatings, he has developed innovative solutions that enhance the performance of integrated circuits.

Latest Patents

Kim Do holds two notable patents. The first patent is titled "Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof." This invention describes compositions for use in tri-layer applications, which include a formulated polymer with silicon-based moieties, vinyl groups, and phenyl groups. The patent outlines methods for producing these compositions, which are essential for creating tri-layer structures in integrated circuits.

The second patent is "Coatings and hard mask compositions for integrated circuit applications methods of production and uses thereof." This patent details a coating material that combines inorganic compounds with densifying agents to enhance the density of the coating material. The method of production involves combining these components to create a high-performance coating suitable for integrated circuit applications.

Career Highlights

Kim Do is currently employed at Honeywell International Inc., where he continues to innovate and develop new materials for various applications. His work has significantly contributed to advancements in the field, particularly in the area of semiconductor manufacturing.

Collaborations

Throughout his career, Kim has collaborated with notable colleagues, including Joseph T. Kennedy and Wei T. Huang. These collaborations have fostered a dynamic environment for innovation and have led to the successful development of new technologies.

Conclusion

Kim Do's contributions to the field of materials science through his patents and work at Honeywell International Inc. highlight his role as a leading inventor in the industry. His innovative approaches to tri-layer applications and integrated circuit coatings continue to influence advancements in technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…