Company Filing History:
Years Active: 2010
Title: Innovations of Inventor Kiesel Peter
Introduction
Kiesel Peter is an accomplished inventor based in Palo Alto, California. He has made significant contributions to the field of semiconductor devices, particularly through his innovative patent. His work focuses on enhancing the performance and stability of semiconductor structures.
Latest Patents
Kiesel Peter holds a patent for a "Method for surfaced-passivated zinc-oxide." This invention describes a semiconductor device that features a heterostructure, which includes a first layer of semiconductor oxide material. A second layer of semiconductor oxide material is formed on the first layer, allowing a two-dimensional electron gas to build up at the interface between the two materials. Additionally, a passivation layer on the outer surface stabilizes the structure, and the device is equipped with a source contact and a drain contact.
Career Highlights
Kiesel Peter is associated with the Palo Alto Research Center Inc., where he continues to push the boundaries of semiconductor technology. His innovative approach has led to advancements that are crucial for the development of modern electronic devices.
Collaborations
Kiesel has collaborated with notable colleagues, including Christian G Van De Walle and Oliver Schmidt. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.
Conclusion
Kiesel Peter's contributions to semiconductor technology through his patent demonstrate his innovative spirit and commitment to advancing the field. His work not only enhances the performance of semiconductor devices but also paves the way for future innovations.