Seoul, South Korea

Ki-jin Park

USPTO Granted Patents = 3 

Average Co-Inventor Count = 5.1

ph-index = 3

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2011-2013

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3 patents (USPTO):Explore Patents

Title: Ki-jin Park: Innovator in Semiconductor Technology

Introduction

Ki-jin Park is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative methods for manufacturing semiconductor devices and improving integrated circuit devices.

Latest Patents

One of Ki-jin Park's latest patents is a method of manufacturing a semiconductor device. This method includes forming a lower film that consists of a cell region and a peripheral circuit region. It involves creating a first sacrificial film on the lower film, which has trenches in the cell region. Additionally, a second sacrificial pattern is formed on the first sacrificial film, featuring line-shaped patterns that are spaced apart and cross the trenches in the cell region. The second sacrificial pattern also covers the top surface of the first sacrificial film in the peripheral circuit region. The process concludes with patterning the first sacrificial film to create upper holes in portions of the trenches that are exposed by the second sacrificial pattern.

Another notable patent by Ki-jin Park involves methods of forming integrated circuit devices using contact hole spacers to enhance contact isolation. This method includes the use of upper sidewall spacers in contact holes to provide improved electrical isolation to contact plugs while maintaining low contact resistance. The process begins with forming an interlayer insulating layer on a semiconductor substrate, which consists of at least a first electrically insulating layer of a first material and a second electrically insulating layer of a second material. A contact hole is then formed that extends through the interlayer insulating layer, exposing a primary surface of the semiconductor substrate. This contact hole is created by selectively etching the second electrically insulating layer and the first electrically insulating layer in sequence, utilizing a faster etch rate for the first material compared to the second material.

Career Highlights

Ki-jin Park is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the semiconductor field. His work has been instrumental in advancing technologies that are crucial for modern electronic devices.

Collaborations

Some of Ki-jin Park's notable coworkers include Doo-Young Lee and Sang-sup Jeong. Their collaborative efforts contribute to the innovative environment at Samsung Electronics.

Conclusion

Ki-jin Park is a key figure in semiconductor innovation, with a focus on methods that enhance device

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