Kevin C Walter

Title: Kevin C Walter: Innovator in Plasma Processing Technologies

Introduction

Kevin C Walter, an accomplished inventor based in Los Alamos, NM, has made significant contributions to the field of plasma processing. With four patents to his name, his work predominantly focuses on the development of advanced coatings utilizing plasma technologies. His innovative approaches have the potential to revolutionize surface engineering and modification in various applications.

Latest Patents

Walter's latest patents include groundbreaking processes for forming adherent coatings using plasma processing. One such patent describes the Plasma Immersion Ion Processing (PIIP), which employs energetic metallic and metalloid ions from high-vapor-pressure organometallic compounds in a plasma environment. This technique allows the deposition of coatings on various substrates while ensuring strong adhesion and controllable composition, thickness, and density. Additionally, this process includes four critical steps: sputter-cleaning, ion implantation, material deposition, and coating stress relief.

Another significant patent highlights a method for depositing diamond-like carbon (DLC) coatings. This environmentally friendly process uses radio-frequency inductively coupled discharge to create plasma at low gas pressures. The resulting DLC coatings are known for their remarkable hardness, transparency to visible light, and scratch resistance, making them ideal for a range of materials including metals, glass, and polymers. Walter’s advancements in doping with boron and silicon have led to coatings with improved optical properties while balancing stress levels and hardness.

Career Highlights

Throughout his career, Kevin C Walter has collaborated with esteemed organizations such as the University of California and Gm Global Technology Operations LLC. His expertise in plasma processing has enabled him to develop innovative solutions that not only enhance material properties but also address environmental considerations in manufacturing.

Collaborations

Walter has worked alongside notable colleagues like Michael A Nastasi and Xiao-Ming He. These collaborations have fostered an environment of research and development that has significantly contributed to advancements in the field of coatings and plasma technology.

Conclusion

Kevin C Walter stands out as a pioneer in the realm of plasma processing innovations. His patents showcase his commitment to enhancing material performance through cutting-edge technologies. As industries continue to seek advanced solutions for surface modification, Walter's work is likely to have a lasting impact, paving the way for future innovations.