Amery, WI, United States of America

Kermit Crain


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 52(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Kermit Crain: Innovator in Parylene Deposition Technology

Introduction

Kermit Crain is a notable inventor based in Amery, Wisconsin. He has made significant contributions to the field of semiconductor manufacturing through his innovative work on parylene deposition technology. His expertise and inventions have played a crucial role in enhancing the efficiency and effectiveness of semiconductor chip production.

Latest Patents

Kermit Crain holds a patent for a parylene deposition apparatus that includes a quartz crystal thickness/rate controller. This apparatus is designed to control the deposition of Parylene AF4 onto silicon wafers, which are essential in the production of semiconductor chips. The unique feature of this invention is that the quartz crystal is located within the deposition chamber, allowing it to receive a coating of parylene that is consistent with the substrate being coated. The vaporization chamber of the apparatus is equipped with a heat transfer receptacle that receives parylene dimer for vaporization. This receptacle includes heating and cooling devices to maintain the appropriate temperature. During operation, parylene monomer deposits onto the surface of the crystal, which varies the vibration frequency of the crystal. The rate of change in frequency is directly correlated with the rate of monomer deposition, allowing for precise monitoring and control of the parylene coating thickness.

Career Highlights

Kermit Crain has dedicated his career to advancing technology in the semiconductor industry. He is currently associated with Specialty Coating Systems, Inc., where he continues to innovate and develop new solutions for parylene deposition. His work has not only improved manufacturing processes but has also contributed to the overall advancement of semiconductor technology.

Collaborations

Throughout his career, Kermit has collaborated with several talented individuals, including John Wary and Roger A Olson. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the field.

Conclusion

Kermit Crain's contributions to parylene deposition technology have made a significant impact on the semiconductor industry. His innovative patent and dedication to his work exemplify the spirit of invention and progress. As technology continues to evolve, Kermit Crain remains a key figure in driving advancements in semiconductor manufacturing.

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