Rochester, NY, United States of America

Kenneth William Best


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Kenneth William Best: Innovator in Photographic Film Technology

Introduction

Kenneth William Best is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of photographic technology, particularly through his innovative work on polyester photographic film support.

Latest Patents

Kenneth holds a patent for a polyester photographic film support. This invention features a photographic film base that comprises a polyester support with a photo-grafted layer of a monomer. The formula for this monomer includes components where R₁ is either --OX or --NX₂, and each R₂ is independently selected from X. This advancement has implications for improving the quality and durability of photographic films.

Career Highlights

Kenneth is associated with the Eastman Kodak Company, a leader in imaging technology. His work at this prestigious company has allowed him to contribute to advancements in photographic materials and processes.

Collaborations

Throughout his career, Kenneth has collaborated with talented individuals such as Cathy A. Fleischer and William Patrick McKenna. These partnerships have fostered innovation and development in the field of photography.

Conclusion

Kenneth William Best's contributions to photographic film technology through his patent and work at Eastman Kodak Company highlight his role as an influential inventor. His innovations continue to impact the industry positively.

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