Location History:
- Rochester, NY (US) (2004 - 2005)
- Hilton, NY (US) (2006 - 2010)
Company Filing History:
Years Active: 2004-2010
Title: Innovations of Kenneth W Best, Jr.
Introduction
Kenneth W Best, Jr. is a notable inventor based in Hilton, NY (US), recognized for his contributions to the field of inkjet technology and optical elements. With a total of 9 patents to his name, Best has made significant advancements that have impacted various industries.
Latest Patents
Among his latest patents is the "Extruded open-celled ink-receiving layer comprising hydrophilic polymer for use in inkjet recording." This invention involves an inkjet recording element that features a support extrusion coated with a porous hydrophilic material. The composition includes a hydrophilic thermoplastic polymer and blends thereof. Additionally, he has developed a "Highly reflective optical element," which consists of a reflective optical film containing a polyester voided with inorganic particles such as barium sulfate. This film achieves a visible light reflectivity of at least 93% and has specific thickness and UV reflectivity characteristics.
Career Highlights
Throughout his career, Kenneth W Best, Jr. has worked with prominent companies, including Eastman Kodak Company and Rohm and Haas Denmark Finance A/S. His work in these organizations has allowed him to refine his skills and contribute to innovative projects.
Collaborations
Best has collaborated with several professionals in his field, including Thomas M Laney and Mridula Nair. These partnerships have fostered a creative environment that has led to the development of his patented technologies.
Conclusion
Kenneth W Best, Jr. is a distinguished inventor whose work has significantly influenced the fields of inkjet technology and optical elements. His innovative patents and collaborations highlight his commitment to advancing technology and improving industry standards.