Saratoga, CA, United States of America

Kenneth Lee


Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 348(Granted Patents)


Company Filing History:


Years Active: 1985-1997

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2 patents (USPTO):Explore Patents

Title: Innovations of Kenneth Lee

Introduction

Kenneth Lee is an accomplished inventor based in Saratoga, CA. He holds 2 patents that showcase his contributions to technology and engineering. His work primarily focuses on advancements in sputtering apparatus and magnetic transducers.

Latest Patents

One of Kenneth's latest patents is titled "Apparatus and method for high throughput sputtering." This invention provides a single or multi-layer coating to the surface of multiple substrates. The apparatus includes several buffer and sputtering chambers, allowing substrates to be transported at varying speeds while maintaining a constant rate for each pallet. This high throughput sputtering apparatus features components that work together to transport substrates, reduce ambient pressure, and heat the substrates uniformly, all controlled by a programmable system.

Another significant patent is "Dual biasing for integrated inductive MR head." This invention involves a dual element magnetic transducer where the thin film MR read element is biased by flux generated in the air gap of the inductive write core. The design allows for efficient manufacturing and improved performance of the magnetic transducer.

Career Highlights

Kenneth has worked with notable companies such as Conner Peripherals, Inc. and IBM. His experience in these organizations has contributed to his expertise in the field of technology and innovation.

Collaborations

Throughout his career, Kenneth has collaborated with professionals like Dennis R. Hollars and Delbert F. Waltrip. These collaborations have likely enriched his work and led to further advancements in his inventions.

Conclusion

Kenneth Lee's innovative patents and career achievements highlight his significant contributions to technology. His work continues to influence the fields of sputtering apparatus and magnetic transducers.

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