Kenneth K Dury

Title: The Innovations of Kenneth K. Dury

Introduction

Kenneth K. Dury is an accomplished inventor based in Kihei, HI (US). He has made significant contributions to the field of integrated circuits, particularly through his innovative patent related to electrical interconnect structures.

Latest Patents

Dury holds a patent for "Electrical interconnect structures for integrated circuits and methods of manufacturing the same." This patent discloses interconnect structures and methods that utilize a bonding surface comprising copper nitride. The interconnect structures are designed to prevent oxidation and other unwanted corrosion of the underlying conductive material while providing a high conductivity bond. The copper nitride bonding surface is effective in offering a non-conductive, corrosion-resistant layer that can be transformed into a conductive layer just prior to bonding.

Career Highlights

Kenneth K. Dury is associated with Kulicke and Soffa Industries, Inc., where he has been able to apply his expertise in the development of advanced interconnect technologies. His work has contributed to the enhancement of integrated circuit manufacturing processes.

Collaborations

Dury has collaborated with notable colleagues such as David T. Beatson and Horst Clauberg, who have also made significant contributions in their respective fields.

Conclusion

Kenneth K. Dury's innovative work in electrical interconnect structures showcases his commitment to advancing technology in integrated circuits. His contributions continue to influence the industry and pave the way for future innovations.