Gainesville, FL, United States of America

Kenneth K Chung



 

Average Co-Inventor Count = 4.5

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Denver, CO (US) (2018)
  • Gainesville, FL (US) (2018 - 2022)

Company Filing History:


Years Active: 2018-2022

Loading Chart...
Loading Chart...
Loading Chart...
3 patents (USPTO):Explore Patents

Title: Innovations of Kenneth K Chung

Introduction

Kenneth K Chung is a notable inventor based in Gainesville, FL (US). He has made significant contributions to the field of surface patterning, holding a total of 3 patents. His work focuses on creating innovative methods for patterning surfaces, which have applications in various industries.

Latest Patents

Kenneth K Chung's latest patents include a method of patterning a surface and articles comprising the same. This invention describes an article with a curved surface, upon which a plurality of patterns is disposed. Each pattern is defined by a series of spaced apart features that are either attached to or projected into the curved surface. Notably, each feature has at least one neighboring feature with a substantially different geometry. The average spacing between adjacent features ranges from about 1 nanometer to about 1 millimeter in certain portions of the curved surface. Furthermore, the features are represented by a periodic function, showcasing the complexity and precision of his work.

Career Highlights

Kenneth K Chung is affiliated with the University of Florida Research Foundation, Incorporated. His role at this esteemed institution allows him to engage in cutting-edge research and development, contributing to advancements in technology and innovation.

Collaborations

Some of his notable coworkers include Anthony B Brennan and Mark M Spiecker. Their collaboration enhances the research environment and fosters innovation within their projects.

Conclusion

Kenneth K Chung's contributions to surface patterning through his patents reflect his dedication to innovation and research. His work continues to influence the field and inspire future advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…