Kenneth Jow

Title: Kenneth Jow: Innovator in Diffusion Barrier Technology

Introduction

Kenneth Jow is a notable inventor based in San Jose, CA, recognized for his contributions to the field of materials science. He has developed innovative solutions that enhance the performance of electronic components. His work primarily focuses on diffusion barrier technologies, which are critical in semiconductor manufacturing.

Latest Patents

Kenneth Jow holds a patent for a "Compositionally graded titanium nitride film for diffusion barrier applications." This patent describes a diffusion barrier film that includes a layer of compositionally graded titanium nitride. The film features a nitrogen-rich portion with a composition of at least about 40% (atomic) nitrogen, which is positioned closer to the dielectric layer. In contrast, the nitrogen-poor portion has a composition of less than about 30% (atomic) nitrogen and is in contact with the metal, such as copper. This innovative barrier film provides excellent diffusion barrier properties, good adhesion to copper, and minimizes uncontrolled diffusion of titanium into interconnects.

Career Highlights

Kenneth Jow is currently employed at Novellus Systems Incorporated, where he continues to advance his research and development efforts. His work has significantly impacted the semiconductor industry, particularly in improving the reliability and efficiency of electronic devices.

Collaborations

Kenneth has collaborated with esteemed colleagues, including Wen Wu and Chentao Yu, to further enhance the development of diffusion barrier technologies. Their combined expertise has contributed to the successful implementation of innovative solutions in the field.

Conclusion

Kenneth Jow's contributions to diffusion barrier technology exemplify the importance of innovation in the semiconductor industry. His patented work on compositionally graded titanium nitride films showcases his commitment to advancing materials science and improving electronic component performance.