Company Filing History:
Years Active: 1993-1996
Title: Innovations of Kenneth J Skrobis
Introduction
Kenneth J Skrobis is a notable inventor based in Madison, WI (US). He has made significant contributions to the field of microstructure formation, holding a total of 5 patents. His work has advanced the understanding and application of photoresist materials in creating complex microstructures.
Latest Patents
One of Kenneth's latest patents focuses on the formation of microstructures using a preformed photoresist sheet. This innovative method involves utilizing a strain-free sheet of photoresist, such as polymethylmethacrylate (PMMA), which can be milled to a desired thickness before or after adhering to a substrate. The photoresist is then patterned through exposure to radiation, such as X-rays, and developed to remove the susceptible material. This process allows for the electroplating of metal into the areas where the photoresist has been removed, enabling the formation of micrometal structures. Additionally, the photoresist can create useful microstructures and can be removed from the substrate using a release layer, facilitating the development of complex three-dimensional microstructures.
Career Highlights
Kenneth J Skrobis is associated with the Wisconsin Alumni Research Foundation, where he has been instrumental in advancing research and innovation. His expertise in microstructure formation has positioned him as a key figure in his field.
Collaborations
Throughout his career, Kenneth has collaborated with notable colleagues, including Henry Guckel and Todd R Christenson. These partnerships have contributed to the success of his innovative projects and patents.
Conclusion
Kenneth J Skrobis is a distinguished inventor whose work in microstructure formation has led to significant advancements in the field. His contributions continue to influence the development of new technologies and applications.